AZO thin film etching morphology optimization and its application in silicon-based thin film double junction solar cells
The transparent conductive oxide film has the characteristics of large forbidden band width and good conductivity, and has good transmittance in the visible light wavelength range. It has been widely concerned, researched and applied in the field of silicon-based thin film solar cells. At present, silicon-based thin-film solar cells made of fluorine-doped tin oxide transparent conductive film (FTO) as the front electrode have formed industrial production; aluminum-doped zinc oxide transparent conductive film (AZO) has better photoelectric performance and rich raw materials And lower cost, strong resistance to hydrogen plasma, good process adjustability and other advantages, it has better development potential in the field of thin-film solar cells. 13. The freely adjustable surface morphology of AZO materials has the effect of improving battery efficiency. Significance. Wet etching is widely used in the preparation of AZO suede. The type, concentration, temperature, and time of the etching solution. With the increase of the deposition temperature, the surface roughness and haze of the AZO film after etching decrease first and then tend to stabilize. , The surface roughness and haze of AZO film showed an upward trend with the increase of sputtering pressure. From the AFM image, it is found that under high sputtering pressure, large pits appear, and it can be seen that as the pressure increases, the film structure becomes looser, the lattice distortion is more serious, and it is easier to corrode the shape of high roughness and high haze. appearance. It can be seen that as the sputtering pressure increases, the transmittance decreases slightly due to the increased haze after the AZO film is etched. Through the above data analysis, it can be seen that the influence of sputtering pressure on the performance of the AZO film after corrosion is smaller than b11, which is not as significant as the deposition temperature. The comparison of surface morphology of samples with different sputtering pressures (normalized) after etching shows an increase in sputtering power and an increase in resistivity. This may be due to the higher sputtering power that tends to damage the growth film and reduce the quality of the AZO film , Which affects the electrical properties of the AZO thin film M. 3.3 The effect of sputtering power on the performance of the AZO thin film after corrosion The comparison of the surface morphology of the samples with different sputtering power (normalized) after corrosion can be seen from and, with the sputtering power As it rises, the haze increases first and then tends to saturation, but the surface roughness and the related length (diameter) of the pits increase significantly. It can be seen that there is an optimal match between the horizontal and vertical dimensions of the pit (ie roughness and related length) to maximize the haze. The matching of the lateral and longitudinal dimensions of the etch pit is represented by the opening angle a. By optimizing the opening angle, the best haze can be obtained. As shown, there is no obvious change in the transmittance of the AZO film after etching, and it is less affected by the sputtering power. This may be because, although the haze tends to increase slightly with increasing power, while the process conditions cause the AZO thin film to change in haze, other optoelectronic performance parameters such as resistivity and transmittance also change. Therefore, the haze and photoelectric performance of the AZO film need comprehensive consideration and optimization before it is possible to produce a high-efficiency solar cell. 4 Conclusions In this paper, magnetron sputtering combined with acid etching method was used to prepare aluminum-doped zinc oxide transparent conductive oxide film, and the deposition temperature, sputtering pressure, sputtering power and key sputtering process parameters were investigated on the photoelectric properties and surface shape of the AZO film after corrosion. Appearance influence. The study found that under the conditions of lower deposition temperature and larger sputtering pressure, the sample is favored to form a surface profile with greater roughness and haze after corrosion, but the transmittance obtained shows a slightly lower trend; while sputtering Although the increase in power can improve the roughness of the sample after corrosion, the increase in haze is small and it quickly shows a saturation trend, and its effect on transmittance is not significant. Therefore, adjusting the deposition temperature and sputtering pressure is a more effective method to adjust the performance of the AZO thin film, and the influence of the sputtering power is relatively small. An AZO thin film with similar resistivity and transmittance and different haze was used as the front electrode to prepare an amorphous / microcrystalline double-junction silicon-based thin film battery. It was found that the greater the haze, the higher the battery short-circuit current density, especially the bottom battery current density. Big. This finding helps to obtain excellent AZO film surface morphology and photoelectric performance by optimizing sputtering process parameters, thereby improving the conversion efficiency of solar cells. Stand Up Desk Adjustable Height
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